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多晶硅副产物二氯二氢硅的应用研究 被引量:8

Application Research on the By-product Dichlorosilane of Polycrystalline Silicon
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摘要 主要针对多晶硅生产过程的副产物二氯二氢硅在还原、氢化、反歧化等工序中的应用进行研究,以期通过合适的处理方法提高多晶硅生产过程中的原料利用率并进一步降低多晶硅的生产成本。 For the application of the byproduct dichlorosilane which is generated in the polycrystalline silicon production in the operation units of reduction,hydrogenation,anti-disproportionation and so on is researched,and with a proper treatment method,the raw material utilization ratio in the process of polycrystalline silicon production is increased and the production cost of polycrystalline silicon is further reduced.
出处 《有色冶金节能》 2014年第3期53-55,58,共4页 Energy Saving of Nonferrous Metallurgy
关键词 多晶硅 二氯二氢硅 反歧化 冷氢化 还原 polycrystalline silicon dichlorosilane anti-disproportionation hydrogenation reduction
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  • 1孙福楠.高纯二氯二氢硅的生产和应用[J].化工新型材料,1996,24(11):27-28. 被引量:3
  • 2沈祖祥,毋克力,严大洲,等.四氯化硅氢化生产三氯氢硅的方法:CN 1436725[P].2003-08-20.
  • 3陈维平.制备三氯氢硅和多晶硅的改进方法和装置:CN 101143723A[P].2008-03-19.
  • 4张日清,范猛,周勇.一种四氯化硅制备三氯氢硅的设备.中国:CN201372206Y[P].2009.
  • 5梁国仑.特种气体贮运、应用、安全与特性——硅烷、砷烷、二氯二氢硅[J].低温与特气,1997,15(1):61-65. 被引量:1
  • 6ALVAREZ-MACAS C,MONROY B M,HUERTA L,et al.Chemical and structural properties of polymorphous silicon thin films grown from dichlorosilane[J].Applied Surface Science,2013,285:431-439.
  • 7VINCENT B,LOO R,VANDERVORST W,et al.Low temperature Si homo-epitaxy by reduced pressure chemical vapor deposition using dichlorosilane,silane and trisilane[J].Journal of Crystal Growth,2010,312(19):2671-2676.
  • 8HARTMANN J M,BENEVENT V,DAMLENCOURT J F,et al.A benchmarking of silane,disilane and dichlorosilane for the low temperature growth of group IV layers[J].Thin Solid Films,2012,520(8):3185-3189.
  • 9BHUSARAPU S,GUPTA P,HUANG Y.Production of polycrystalline silicon in substantially closed-loop processes that involve disproportionation operations:US Patent Application,13/328 029[P].2011-12-16.
  • 10ABE I,TOMITA S.Process for producing monosilane from dichlorosilane:US Patent Application,13/820 450[P].2011-08-29.

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