摘要
内部水汽含量值过高是直接影响石英晶体元件在高空、低温下工作稳定性的重要因素。针对按常规工艺生产的石英晶体元件,内部水汽含量远高于要求(小于5 000 ppmV)的现象,介绍采用一种特殊的加工工艺方法,通过试验验证采用该方法加工的产品,明显改善了其内部水汽的含量,满足了GJB548A-96、GJB33A-97等国家标准规定的电子元器件水汽含量建议范围:100℃±5℃,烘焙24小时以上,小于5 000 ppmV的要求。从而达到提升石英晶体元件在高空、低温下工作稳定性的目的。
High internal water vapor content value is directly affect the quartz crystal components working under high and low temperature stability of the important factors. In view of the quartz crystal components according to the conventional process, internal water vapor content is much higher than required （less than 5 000 ppmV） phenomena, introduced a kind of special processing methods, processing of products by the method are verified through the experiment, and significantly improved its internal water vapor content, satisfied GJB548A - 96, GJB33A - 97 standard regulations of the state of electronic components such as the water vapor content recommended range： 100℃ to ＋ / - 5 ℃ , for more than 24 hours, less than 5 000 ppmV requirements. Quartz crystal components at high altitude, so as to promote the purpose of the work under the low temperature stability.
出处
《电子设计工程》
2014年第7期71-73,共3页
Electronic Design Engineering
关键词
石英晶体
内部水汽含量
控制
加工工艺
quartz crystal
moisture content
control
processing technology
