摘要
为研究感应耦合等离子体(ICP)沉积装置放电腔与线圈结构以及工艺参数对等离子体分布的影响,基于商业软件CFDRC中等离子体与电磁场模块建立了ICP沉积装置2维放电模型。在典型的ICP反应器中,等离子体反应主要由电子、重粒子间的碰撞来决定。利用不带电的流体模型求解分子、原子和基团等中性粒子的动量和质量守恒方程,而对离子带电粒子,考虑电场力的作用来求解动量方程;电子通量密度的计算是通过求解漂移扩散近似方程而获得的。通过此方法仿真研究了典型工艺条件下(气压0.25 Pa,功率90 W,体积流量120 L/s)等离子体离子数密度的空间分布,对比了不同功率(20、60、90、150 W)、不同抽气体积流量(60、100、140、160 L/s)条件下放电腔内ICP等离子体参数的变化规律。模拟结果表明:离子数密度随体积流量的增加而大幅度增加,随功率的增加而缓慢增加;空间离子数密度峰值出现在放电腔中心区域,随体积流量的增大而逐渐下移。
Abstract. In inductively coupled plasma （ICP） deposition device, the structure of discharge cavity and coil, as well as some process parameters, may influence the plasma distribution, In order to study this influence, we establish a two-dimensional discharge model using the plasma and electromagnetic module of the software CFDRC. In typical ICP reactors, plasma reactions are mainly determined by collision between ions and electrons. In the calculation, the momen- tum and mass conservation equations of neutral particles （molecular, atoms and perssad） are solved using a charge-free flow module, while the momentum equations of charged particles （ions, radicals, metastables） are solved taking electric field force into consideration, and the electron number density is obtained from quasi-neutrality condition. Through this method, we investigated the ion density spatial distribution of ICP in a discharge cavity under the typical process condi- tion （0.25 Pa, 90 W, 100 L/s）, as well as some parameters of the ICP under different powers （20, 60, 90, 150 W） and different pumping speeds （60, 100, 140, 160 L/s）. The simulative results show that the ion density increases slowly with power but substantially with pumping speed, while the peak value of ion density appears in the center region of the dis- charge chamber and it decreases gradually with pumping speed.
出处
《高电压技术》
EI
CAS
CSCD
北大核心
2014年第1期206-211,共6页
High Voltage Engineering
基金
广东省高等学校高层次人才项目(粤财教[2011]431号)
广东省育苗工程项目(LYM11031)~~
