摘要
采用中频非平衡反应磁控溅射技术在单晶硅P(111)基材上制备了CrSiN纳米复合薄膜。利用X射线衍射仪(XRD)、X射线光电子能谱仪(XPS)、Kevex能谱仪(EDX)、高分辨率透射电子显微镜(HRTEM)和纳米压痕仪对薄膜的相结构、化学成分组成和力学性能进行了测试分析。利用球-盘式摩擦磨损试验机(UMT-2)考察了薄膜和GCr15钢球对磨的摩擦学性能并采用扫描电镜(SEM)观察磨痕形貌。结果表明:CrN薄膜中Si元素的掺杂改变了薄膜晶体结构,所制备的CrSiN复合薄膜为多相复合结构,即nc-CrN/aSi3N4所组成的纳米晶/非晶复合结构。CrSiN纳米复合薄膜的力学性能均优于CrN薄膜,其硬度均高于CrN薄膜的硬度,其中Si原子数分数为12.6%时薄膜的硬度达到最大,对应纳米晶/非晶复合强化。CrSiN纳米复合薄膜的摩擦因数低于CrN薄膜,具有很好的抗磨损性能,并具有一定的润滑作用。
The CrSiN films with various Si contents were deposited on silicon （111） by middle frequency un balanced reactive magnetron sputtering. The crystal construction, chemical composition, cross sectional struc ture and mechanical properties of the resultant films were studied by X-ray diffraction （XRD）, X-ray photoe lectron spectroscopy（XPS）, Kevex spectroscopy（EDX） and nano - indentation instrument, respectively. The tribological properties of the films sliding against GCr15 balls were investigated by ball-on-disk tribometer （UMT-2）. The results show that the CrSiN films present the nanocomposite structure of nc-CrN/a-Si3 N4 , composed of CrN crystal and amorphous Sia N4 matrix. The mechanical properties of the CrSiN films are enhanced owing to the nanocomposite structure. The hardness of CrSiN film with 12.6% Si reaches the maxi mum owing to the formation of nanocomposite structure. The low friction coefficient and high wear resistance are presented in the CrSiN films compared with the CrN film.
出处
《中国表面工程》
EI
CAS
CSCD
北大核心
2013年第5期24-30,共7页
China Surface Engineering
基金
国家自然科学基金(11104126)
