摘要
为配合Ⅲ Ⅴ族半导体研制和评定金属有机物化学气相沉积 (简称MOCVD)装置的尾气处理效果 ,及其对安全的影响 ,研究了用气相色谱对所用的高纯氢化物的杂质、检测灵敏度及相对保留值 ;混合氢化物的组分 ;反应尾气中有害物在处理前后的含量变化等进行了测定。组分分离较好 ,相对标准误差小于 2 3 %。
In order to cooperate the development of the Ⅲ～Ⅴ groups semiconductors and evaluate the treated effect of the tail gas with the installation of MOCVD and check on the effect of safety. The determination of the impurity of the all used high pure hydrides,detect sensitivity and relative ratio retention,compsition of mixed hydrides. The content change over of the harmful composition in the reaction tail gas before the treatment and after by gas chromatography. The composition is separated very well,the relativ standard deviation (RSD) less than 2.3% . The environmental quality is conformed to the state standard.
出处
《应用化工》
CAS
CSCD
2000年第4期32-34,共3页
Applied Chemical Industry
关键词
挥发性
无机氢化物
反应尾气
气相色谱分析
inorganic hydrides
MOCVD( metal organic chemical vapour deposition)
reaction tail gas
gas chromatographt
