摘要
用磁控溅射法制备了Fe N薄膜和Fe N/TiN多层膜。结果表明 ,在常温下 ,使用较小的氮、氩比溅射 ,生成的Fe N薄膜主要是含氮α Fe固溶体 ,并且N原子进入α Fe晶格是饱和磁化强度提高的一个原因。Fe N/TiN多层膜的层间耦合作用以及减小每一Fe N层厚度而引起的晶粒尺寸的减小可以有效地降低薄膜的矫顽力 。
Fe N films and Fe N/TiN multilayers grown by DC magnetron sputtering were studied.The results show that the films grown at room temperatures in a gas mixture of small N 2/Ar ratio mainly consist of α Fe phase,the incorporation of N atom into α Fe matrix results in the formation of α Fe solid solution and an increase of the magnetic flux density.The results of Fe N/TiN multilayers show that the interlayer coupling in the multilayer in combination with the grain size reduction due to the narrowing of the Fe N layer thickness may considerably lower the coercive force of the films,and favorably improve the soft magnetic properties.
出处
《真空科学与技术》
EI
CSCD
北大核心
2000年第5期311-314,共4页
Vacuum Science and Technology
基金
国家自然科学基金重大项目资助!批准号 :19890 310
