摘要
为了获得氮化硅陶瓷球超光滑表面,提出了一种新的球体双平面抛光方法,通过球体在上下软质盘面之间不断的自旋和滚动实现球面的抛光,从而减小传统铸铁磨盘抛光方法对陶瓷球表面造成的机械损伤。通过试验研究了抛光速度、抛光压力和水基CeO2抛光液浓度对氮化硅陶瓷球表面粗糙度Ra和球形误差ΔRSW的影响,并给出了优选的抛光工艺参数。
In order to obtain super smooth surface of Si3 N4 ceramics balls, a new type of dual - plane polishing method is proposed for polishing balls. The material is removed evenly by making the balls spinning and rolling constantly between the soft plates, so the surface mechanical damage can be reduced compared to conventional cast iron plate polishing method. The influence of polishing speed, polishing pressure and CeO2 polishing slurry concentration on the surface roughness Ra and spherical error △asw of Si3 N4 ceramics balls is studied , and the optimized polishing process parameters are given.
出处
《轴承》
北大核心
2013年第3期11-15,共5页
Bearing
基金
江苏省科技支撑计划(BE2011063)
常州市科技局项目(CJ20115005)
关键词
滚动轴承
氮化硅陶瓷球
抛光
双平面式
rolling bearing
silicon nitride ceramics ball
polishing
dual-plane type
