摘要
采用纯化学处理方法对NiTi形状记忆合金表面进行羟基磷灰石膜层的沉积,通过改变脉冲频率和脉冲处理时间,探讨了电脉冲作用下钙化处理对NiTi形状记忆合金表面涂膜的影响,分析了不同浓度配置的钙化液,以及脉冲参数对试样表面羟基磷灰石膜层生长的响应规律。结果表明:浓度为Ca2+3.10 mmol/L,K+4.64 mmol/L,Na+126.8 mmol/L,Cl-144.5 mmol/L,HPO42-1.86 mmol/L,pH值呈弱碱性的钙化液最适合于钙磷层的生长;经适当处理后,试样表面生成了疏松多孔的钙磷层,经检测其为羟基磷灰石和其他钙磷盐的混合物;电脉冲的加入在一定程度上加速了钙磷层的沉积,并提高了生成的羟基磷灰石膜的纯度。
The hydroxyapatite layer on the surface of NiTi shape memory alloy was deposited by chemical technology, and the influence of the calcification treatment on the apatite layer in the effect of electrical pulse modification was discussed by changing pulse frequency and pulse treatment time, and the respond mechanisms of different consistence of calcification solution and pulse parameter were analyzed. The results indicate that when the consistence of calcification solution is Ca^2＋ 3.10 mmol/L, K＋ 4.64 mmol/L, Na＋ 126.8 mmol/L, C1- 144.5 mrnol/L, HPO24- 1.86 mmol/L and the pH value is alkalescent, the quality of hydroxyapatite layer is best; after appropriately treated, there is a loose and porous apatite layer on the surface of the sample, it is a mixture of hydroxyapatite （HA） and other calcium phosphorus salt. The process of electric pulse modification is beneficial to speeding the deposition of apatite layer and enhancing the purity of hydroxyapatite.
出处
《铸造技术》
CAS
北大核心
2013年第3期279-282,共4页
Foundry Technology
关键词
NITI形状记忆合金
羟基磷灰石膜层
化学处理
电脉冲
NiTi shape memory alloy
hydroxyapatite layer
chemical technology
electric pulse modification
