摘要
在玻璃基片上采用金属Al靶在溅射气体Ar和反应气体O2的混合气体中,真空磁控溅射半透明的Al-Al2O3金属陶瓷薄膜,再将沉积薄膜的玻璃基片浸入沸腾的去离子水中氧化,制备成陶瓷增透膜。优化镀膜工艺和沸水氧化时间,在3.2 mm厚的低铁玻璃载片上单面沉积的增透膜的太阳透射比Te由未镀膜原片的90.4%增加到93.9%,提高了3.5%,可见光透射比Tv由91.6%增加到95.5%,提高了3.9%。双面沉积增透膜玻璃载片的Te达到96.2%,增加了5.8%,Tv达到97.2%,增加了5.6%。经过400℃高温持续40 min烘烤后膜层的光学性能基本不变。
：The translucent Al-7Al2O3 cermet thin films were deposited on glass substrates by vacuum magnetron reactive sputtering using Al target in the mixture of Ar arid O2 gases. As-sputtering deposited films become transmittance-increasing ceramic films by hydrothermal oxidation method in boiling pure water. Optimizing sputtering parameters and hydrothermal oxidation techniques, for the film deposited on the one side of 3.2 mm thickness low-iron glass, the solar transmittance Te is increased by 3.5%, from 90.4% for uncoated glass substrate to 93.9%; visible transmittance Tv is increased by 3.9%, from 91.6% to 95.5%. For the film deposited on both sides of the glass substrate, the solar transmittance Te reaches as high as 96.2%, increased by 5.8%, and the visible transmittance Tv achieves 97.2%, increased by 5.6%. The optical properties of the transmittance-increasing films are unchanged after baked at 400% for 40min.
出处
《真空》
CAS
2013年第2期27-30,共4页
Vacuum
关键词
增透膜
反应溅射
沸水氧化
氧化铝
低铁玻璃
transmittance-increasing film
reactive sputtering
hydrothermal oxidation
alumina
low-iron glass
