摘要
用金属蒸汽真空弧离子(MEVVA)源注入金属离子,能以较低的离子能量而获得较厚的注层.掺杂浓度高,容易诱生金属间化物沉淀,是一种有工业应用价值的强流离子源.讨论了注入原子的状态和分布特征,说明了 MEVVA 源可能的使用前景.
Because ot high flux,ion implantation using a MEWA source can modify a thicker surface layer with metallic ions of rather low energies.Beam heating helps to retain a higher concentration ot implants and to induce intermetallic compounds as fine precipitates.These make MEWA a valuable high current ion source in industrial applications.The behaviour and state of the implanted atoms are characterized and the potential pros- pects of MEVVA are predicted.
出处
《北京师范大学学报（自然科学版）》
CAS
CSCD
1991年第2期163-168,共6页
Journal of Beijing Normal University(Natural Science)
基金
"八六三"高科技研究资助项目
关键词
MEVVA
离子注入
金属改性
离子源
beam heating
concentration profile
precipitate
intermetallic compounds
