摘要
为满足离子注入材料改性研究和实际应用的需要。研制了一个金属蒸汽真空弧(简称MEVVA)离子源.这是一新型离子源种,它利用阴极和阳极间的真空弧放电原理由阴极表面直接产生高密度金属等离子体,经一多孔三电极系统引出得到强流金属离子束.该源脉冲工作方式,已引出Al,Ti,Fe,Cu,Mo和W等离子,脉冲离子束流强度为0.6～1.26A,Ti的平均束流强度已达10mA.引出束流大小与源的工作参数、引出结构和电压以及阴极材料有关。该源没有气体负载,工作真空度为3×10^(-4)Pa。
A new kind of ion source, the matal vapor vacuum arc (MEVVA) ion source is developed to meed the needs in research and practice in material modification by ion implantation. The source makes use of vacuum arc discharge between cathode and anode to create high dense metal plasma from which an intense beam of metal ions is then extracted with a three grid multiaperture extractor. The MEVVA source operates in a pulsed mode. A beam current about 0.6～1.26 A per pulse is extracted for Al, Ti, Fe, Cu, Mo and W. The time-average beam current is about 10mA for Ti. The extracted beam current depends on operating parameter of source, extraction voltage and cathode material. This source neither requires nor produces a gaseous ambient in its operation. The operating presure is about 3×10^(-4)pa.
出处
《北京师范大学学报（自然科学版）》
CAS
CSCD
1991年第1期23-28,共6页
Journal of Beijing Normal University(Natural Science)
基金
"八六三"高技术项目资助课题
关键词
离子源
离子注入
材料改性
金属
ion source
vacuum arc discharge
metal plasma
ion beam
