摘要
分别建立了真空镀膜机行星系统中平面光学元件薄膜厚度模型和修正挡板校正薄膜厚度非均匀性模型,并运用数值计算方法完成修正挡板优化设计;研究了使用修正挡板校正薄膜厚度分布时平面行星夹具上热蒸发薄膜材料的沉积效率。实验结果表明:依据修正挡板校正薄膜厚度非均匀性模型优化设计的修正挡板能使口径为310mm、无倾斜放置的平面行星夹具上,由电子束热蒸发工艺制备的MgF2薄膜厚度均匀性优于99.6%,并且热蒸发MgF2薄膜材料的沉积效率高于87.4%。
In a deposition system containing a planar planetary substrate holder, models for film thickness distribution without and with shadowing mask are developed. The shadowing mask optimized by numerical computation method is applied to achieve good thickness uniformity, while the deposition efficiency of the evaporated material is taken into consideration in the optimization, Experimentally, the theoretically designed shadowing mask is used to control the thickness distribution of the MgF2 coatings deposited by electron beam evaporation on a flat substrate with a planar planetary system. Uniformity measurements based on the reflection spectra of single layer MgF2 films demonstrate that uniformities is better than 99.6 %, while the deposition efficiency of the evaporated material is higher than 87.4 %.
出处
《光学学报》
EI
CAS
CSCD
北大核心
2013年第2期284-288,共5页
Acta Optica Sinica
关键词
薄膜
光学镀膜
厚度均匀性
修正挡板
行星系统
thin films
optical coating
thickness uniformity
shadowing mask
nlanetarv system
