摘要
基于光激活物质空间迁移长度的概念，推导出方形反应空间中到达基片上单位面积的光激活物质总数的解析表达式，对光化学汽相沉积中淀积速率和基片位置的关系进行了模拟和分析． 模拟结果同实验结果符合良好．
Based on the concept of space migration length of photo activation species,the analytical expression of the total number N of photo activation species that can reach a segment on the substrate in the cubic deposition reaction space is derived.The simulation of the relationship of deposition rate and position of substrate is also completed.The simulation result agrees with the experiment data well.
出处
《光子学报》
EI
CAS
CSCD
2000年第1期78-81,共4页
Acta Photonica Sinica
