摘要
为提高面形检测的复现性,研制了一套检测支撑装置,配合高重复性干涉仪实现高复现性的面形检测,对该装置的复现性效果进行了仿真计算和实验验证。利用ANSYS软件仿真分析确定了各向干扰力对面形的影响,同时推导确定不同支撑方案所能实现的复现性。仿真分析结果表明,检测支撑方案最高能够实现均方根(RMS)误差优于30pm的面形复现性结果。确定了最终检测支撑装置的结构形式,并在高重复性干涉仪上进行了面形复现性测试,测试结果表明,由检测支撑装置引起的面形复现性指标RMS优于70pm,满足RMS为0.1nm的复现性设计指标要求。
In order to improve the reproducibility in mirror metrology, a mirror mount used in high repeatability interferometer is developed, and simulations and testing are undertaken to evaluate the device. The deformation of the mirror due to disturbance in the mount is analyzed with ANSYS and the reproducibility of different metrology mount is calculated. The calculation results indicate that root mean square （RMS） of the reproducibility that the mount can be achieved is better than 30 pm. The structure of the device is finally confirmed, and reproducibility testing is carried out on high repeatability interferometer, the testing result indicates that RMS of the reproducibility caused by the mount devise is better than 70 pm, which meet the 0.1-nm RMS requirement of the error budget.
出处
《中国激光》
EI
CAS
CSCD
北大核心
2012年第11期131-135,共5页
Chinese Journal of Lasers
基金
国家科技重大专项基金资助课题
关键词
测量
极紫外光刻
高重复性干涉仪
有限元分析
检测支撑
measurement
extreme ultraviolet lithography
high repeatability interferometer
finite-element analysis
mirror mount for metrology
