摘要
分析图像相关识别中的纯相位匹配滤波器的模式识别方法,利用该滤波器的相关识别位图计算算法,及其所具有的相干峰尖锐特性与高度旋转敏感特性,分别求取得光刻套刻过程中,掩模板和硅片基板对准标记的相对平移坐标与旋转坐标的精密量化驱动值。将此算法的实施单元建立在一套成型的大面积投影光刻系统中,使得该系统的对位精度与对位效率显著地提高。
A pattern recognition named phase-only matched filtering is presented to realize high precision alignment in projecting lithography. The method achieves the alignment with the characteristic direction of templates and silicon substrate using the coherent peak rotating sensitive feature in the filter. Meanwhile the relative translation distance of templates and silicon substrate is obtained in recognition algorithms. Such an alignment system is assembled in our mature projection lithography machine, and the experimental data obtained prove the higher accuracy and efficiency compared with conventional algorithms.
出处
《量子电子学报》
CAS
CSCD
北大核心
2012年第6期764-768,共5页
Chinese Journal of Quantum Electronics
基金
国家自然科学基金(61107029
60977029)
广东省自然科学基金(07001789)
广东省科技计划项目(2007B010400071)
广东省创新实验项目(1184510158
HSZJ2011089)资助课题
关键词
激光技术
光刻
套刻技术
模式识别
纯相位匹配滤波器
laser techniques
lithography
alignment technology
pattern recognition
phase-only matchedfiltering
