摘要
采用电弧离子镀技术在铸造镍基合金 Ｋ１７和 Ｎｉ３Ａｌ基合金 ＩＣ－６上沉积 Ｎｉ－Ｃｒ－Ａｌ－Ｙ涂层结果表明，在沉积过程中由于电弧离子镀的“溅射”和“反溅射”效应以及基体和涂层发生互扩散的共同作用下，沉积的 Ｎｉ－Ｃｒ－Ａｌ－Ｙ涂层在靠近基体区含有少量基体元素，如 Ｃｏ， Ｔｉ和 Ｍｏ等 Ｋ１７合金中的 Ａｌ元素可抑制 Ｃｒ由涂层向基体扩散 ＩＣ－６合金中由于还含有 Ｍｏ元素，使这种抑制作用进一步增强在 １０５０ ℃真空热处理时，各元素互扩散能力增强，大量的 Ｃｒ克服 Ａｌ和 Ｍｏ元素的束缚向基体扩散，最终使两种合金上沉积的Ｎｉ－Ｃｒ－Ａｌ－Ｙ涂层中的元素均匀分布。
Ni-based alloy K17 and Ni3Al-based alloy IC-6 were used as substrates coated with Ni-Cr-Al-Y coating deposited by arc ion plating (AIP). The results of the tests show that a few of elements of Co, Ti and Mo etc., which come from substrates were observed in near-surface zones of NiCr-Al-Y coating. It corresponds to the 'sputter' and 'anti-sputter' effect of AIP during deposition process. Atoms Cr distributed from coating to substrate were inhibited by Al contained in alloy K17. In alloy IC-6 with high concentration of Mo, the' restraint becomes stronger. During vacuum heat treatment at IO50 ℃, the activities of various elements were increased, while the resistance of diffusion of Cr by Al and Mo was decreased. A great deal of Cr diffuses from coating to substrate. As a result, the distributions of various elements are not only homogeneity but also close to nominal compositions.
出处
《金属学报》
SCIE
EI
CAS
CSCD
北大核心
2000年第10期1094-1098,共5页
Acta Metallurgica Sinica
