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基于Si3N4薄膜的纳米孔制备及λ-DNA分子检测(英文) 被引量:1

Fabrication of Si_3N_4 Nanopore and Detection of λ-DNA Molecules
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摘要 随着纳米加工技术的快速发展,纳米孔传感器越来越多的运用于生物大分子检测。本文利用聚焦离子束微纳加工技术在100 nm厚的氮化硅薄膜上制备出50 nm~60 nm孔径的纳米孔,将带有纳米孔的硅基片密封在两个有机玻璃液池内,在液池两侧加入氯化钾溶液,同时施加一定的偏置电压,利用膜片钳放大器可以实时监测离子穿越纳米孔所产生的离子电流,当在液池的一侧加入λ-DNA后,在电场力的作用下,λ-DNA分子穿越纳米孔由于物理站位作用从而引起离子电流的下降。 A simple fabrication processes of nanopore based on Si3N4 membrane are discussed in this research.The key feature of these processes is the use of focused ion beam(FIB).The diameter of nanopore is about 50 nm^60 nm.PolymethylMethacrylate(PMMA)cells are designed to mount the silicon support chip between two liquid reservoirs filled with buffered electrolytic solution.When we add λ-DNA molecules in the negative electrode side,the translocation of λ-DNA molecules through the nanopore is investigated.
出处 《传感技术学报》 CAS CSCD 北大核心 2012年第7期876-879,共4页 Chinese Journal of Sensors and Actuators
基金 National Basic Research Program of China(2011CB707601) Natural Science Foundation of China(50875047,50925519,51005048,51003015) Jiangsu Province Nature Science Foundation(BK2008201,BK2009292)
关键词 纳米孔 聚焦离子束 氮化硅薄膜 过孔 Λ-DNA nanopore Si3N4 membrane FIB translocation λ-DNA
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