摘要
研究了直流磁控溅射Ti、TiMo、TiMoY及TiMoYAl薄膜的形貌、结构和力学性能,探讨了合金化对Ti膜的影响。结果表明,合金化使Ti膜由α相结构转变为α+β双相结构,改变了薄膜的择优取向,降低了薄膜表面粗糙度,并改善了薄膜的力学性能。
Thin films of Ti and its alloys TiMo,TiMoY and TiMoYAl were deposited on monocrystalline silicon substrates by direct current magnetron sputtering.The morphology and structure of thin films were analyzed by SEM,AFM,XRD and TEM.The experimental results indicate that the addition of alloy elements leads to the formation of a more uniform and finer-grained film structure.X-ray diffraction analysis shows that the alloy films are composed of two phases： α-Ti and β-Ti.In addition,Ti and TiMo thin films are of（002） preferential orientation,as to TiMoY and TiMoYAl films,the（002） preferential orientation intensity decreases rapidly while（101） orientation intensity increases.Moreover,the mechanical properties of thin films were tested,and the results show that the alloy films exhibit higher hardness.
出处
《原子能科学技术》
EI
CAS
CSCD
北大核心
2012年第6期744-748,共5页
Atomic Energy Science and Technology
基金
国家自然科学基金资助项目(51171184)
关键词
磁控溅射
Ti膜
合金化
magnetron sputtering
Ti films
alloying
