摘要
在半导体投影光刻机中,对因工艺处理产生的非对称型相位光栅对准标记作了详细分析,提出了关于衍射效率、对准信号及对准误差的计算模型,并着重分析了CMP型对准标记和金属淀积型标记的相应特点。
This paper studies the asymmetric alignment mark of phase grating induced by IC process in the projection lithography and builds a calculation model of the diffractive efficiency, alignment signal and alignment errors of the asymmetric mark, especially analyzes that about CMP mark and metal deposited mark.
出处
《电子工业专用设备》
2012年第5期19-23,共5页
Equipment for Electronic Products Manufacturing
关键词
相位光栅
非对称型对准标记
衍射效率
对准信号
对准误差
phase grating
asymmetric alignment mark
diffractive efficiency
alignment signal
alignment error
