摘要
结合钽粉的生产方法,对近几年高比容电容器级钽粉的发展进行了简要叙述,显示了高比容钽粉的研究水平。介绍了80 000μFV/g钽粉的研究状况和今后的工作目标。
This article gives a brief description of the recent progress and the current state of the art in the research on the methods of high CV tantalum powder. A review of the. work on 80 K CV tantalum powder and the targets for the future is also provided.
出处
《材料导报》
EI
CAS
CSCD
北大核心
2000年第5期8-9,共2页
Materials Reports
