摘要
目的:建立下颌双侧游离端缺牙种植覆盖义齿修复的光弹模型,为研究不同上部结构种植覆盖义齿种植体及其基牙周围支持组织的应力状况提供基础模型。方法:以环氧树脂模拟下颌骨,硅橡胶模拟牙槽黏膜和牙周膜,采用临床常用种植体和3种上部附着结构,按临床实际操作步骤制得双种植体支持的下颌双侧游离端缺牙种植覆盖义齿修复的光弹模型。结果:制得含种植体的环氧树脂光弹模型呈淡黄色,质地均匀,透明,无初应力;牙体、牙槽骨、牙周膜的弹性模量之比及基牙牙周膜和缺牙区黏膜厚度与临床实际相接近,并能够在保持模型其他条件不变的情况下方便的替换种植覆盖义齿上部附着结构。结论:所建模型可用于不同上部结构种植覆盖义齿种植体及其基牙周围支持组织的应力分析。
AIM： To establish a mandibular bilateral distal-extension edentulous photoelastic model for a- nalysis of stress distribution in the supporting structure around the implants on implant-supported overdentures. METHODS ： Photoelastic ethoxyline resin and silicone rubber gum were used to simulate the mandible and the alveolar mucosa respectively. Using the commonly used implants and 3 types of upper attachments, the 2-implant supported mandibular overdentures photoelastic model was made. RESULTS： The ethoxyline resin model was faintly yellow, homogeneous, transparent, and had no natural stress. The elastic modulus ratio of teeth, alveolar bone, periodontal ligament and the thickness of periodontal ligament, edentulous ridge mucosa were close to actual clinical data. The at- tachment structure could be replaced conveniently without changing other parts of the model. CONCLUSION： The model is applicable to qualitative analysis of stress distribution in the supporting structure around the implants.
出处
《牙体牙髓牙周病学杂志》
CAS
北大核心
2012年第5期271-274,共4页
Chinese Journal of Conservative Dentistry
基金
上海科委科研计划项目(114119a3600)
关键词
光弹实验
种植覆盖义齿
下颌游离端缺牙
应力分析
photoelastic
implant- supported overdenture
mandibular bialateral distal- extension edentulous
stress distribution analysis
