摘要
电子束蒸发由于其显著的优点应用日趋广泛,成为工业镀膜工艺中最主要的技术之一。基于真空镀膜技术,首先对电子束蒸发的定义进行了阐述,介绍了电子束蒸发源的特点及优势,详细说明了e型电子束蒸发源的结构及工作原理。重点分析了电子枪灯丝与聚束极的相对位置对束斑及束流大小的影响。结合维修经验对e型电子束蒸发源的日常维护进行了总结,对更换电子枪灯丝步骤及注意事项进行了细致说明,着重提出了腔室及蒸发源的洁净度对工艺质量的影响。最后对于蒸发过程中常见故障现象及解决方法进行说明。
In virtue of its outstanding advantages,electron beam evaporation（EBE） has an increasingly extensive application,and becomes the main technology in the industrial vacuum plating process.The definition of EBE was explained,the main feature and the advantage of the EBE source were described,the structure and the working principle of the e type EBE sources were explained in detail.How the relative installation position between the filament and beam-formming electrode affects the beam current and size were analyzed especially.According to the working experience,the daily maintenance for the e type EBE source was summarized.The announcements and procedure to replace the filament were described.The influence of the cleanliness in the chamber and source on the process quality was analyzed.The fault phenomenon and troubleshooting were introduced.
出处
《半导体技术》
CAS
CSCD
北大核心
2012年第5期386-389,共4页
Semiconductor Technology
关键词
电子束
电子枪
束斑
故障现象
维修
electron beam
electron gun
beam spot
trouble phenomenon
troubleshooting
