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真空电子束蒸发制备Nd∶YAG薄膜 被引量：1

Nd∶Y_3Al_5O_(12) Thin Film Prepared by Vacuum Electron Beam Evaporation Deposition
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摘要 采用真空电子束蒸发镀膜工艺制备纳米厚度的Nd∶YAG薄膜,经1 100°C真空高温退火处理使Nd∶YAG薄膜有效结晶,对Nd∶YAG薄膜的表面形貌、晶体结构、光致发光特性进行了测试。 Nd∶YAG nanometer thin films have been prepared with the electron beam evaporation deposition in high vacuum atmosphere.The crystallization of Nd∶YAG thin film was improved via annealing at 1100 °C for 1 hour.The surface morphologies、crystalline phases and photoluminescence of Nd∶YAG thin films were tested and investigated.
作者 任豪 曾群 庞振华
机构地区 华南师范大学信息光电子科技学院 广州市光机电技术研究院
出处 《光电子技术》 CAS 北大核心 2012年第1期56-58,共3页 Optoelectronic Technology
基金 广州市应用基础研究计划(200951-C411)
关键词 Nd∶YAG薄膜 电子束蒸发 光致发光 Nd∶YAG thin film electron beam evaporation photoluminescence1
分类号 O484.4 [理学—固体物理]
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参考文献5

  • 1刘颂豪,李淳飞著.光子学技术与应用[M].广州:广东科技出版社,安徽科技出版社,2006:336
  • 2Hanna D C,Large A C,Shepherd D P,et al.Low thresholdquasi-three-level 946 nm laser operation of an epitaxiallygrown Nd∶Y3Al5O12waveguide[J].Appl Phys Lett,1993,63(1):7-9.
  • 3Field S J,Hanna D C,Large A C,et al.Low threshold ion-implanted Nd∶YAG channel waveguide laser[J].ElectronLett,1991,27:2375-2376.
  • 4孙志红,袁多荣,段秀兰,魏学成,栾彩娜,黎浩强.溶胶-凝胶法制备YAG材料概述[J].硅酸盐通报,2004,23(4):59-62. 被引量：9
  • 5Mizunori Ezaki,Minoru Obara,Hiroshi Kumagai,et al.Characterization of Nd∶Y3Al5O12thin films grown on varioussubstrates by pulsed laser deposition[J].Appl Phys Lett,1996,69(20):2977-2979.

二级参考文献20

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光电子技术
2012年 第1期

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