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重复激光脉冲作用下薄膜损伤演化规律研究 被引量:4

Accumulation effect of film damage under repetitive laser pulses
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摘要 为了深入研究重复激光脉冲的能量效应对光学薄膜的烧蚀机理,采用实验观测与热力学分析相结合的方法进行了研究。通过观察光学薄膜烧蚀形貌随入射激光脉冲数量增加发生改变的典型形貌特征,分析了激光与等离子体相互作用的热力学过程,得到了在激光重复脉冲作用下光学薄膜的损伤特性及其演化规律。结果表明,薄膜在重复脉冲作用下,其表面会变得粗糙,这会大大增加对激光的吸收效应,从而加速了薄膜的破坏,最终被完全去除而露出基底;同时,烧蚀物会在热膨胀作用下向激光作用区域外扩散,在激光烧蚀中心区域外进行沉积,而形成更大范围的污染。由于激光光强为高斯分布,重复脉冲作用的效应主要是对在光束中心区域的薄膜进行集中烧蚀,会不断增加烧蚀的损伤程度,而对烧蚀面积的增加效应极为有限。这一研究结果为重复激光脉冲对薄膜烧蚀机理的建立提供了参考。 In order to study the accumulation effect of film damage under repetitive laser pulses , experimental observations and thermodynamic analysis were carried out .The morphologies damaged by single and multiple laser pulses were observed under a 5000 × microscope, then the thermodynamic process between the interaction of laser and plasma was analyzed.Finally the evolution rule of the film damage was found .Both of these two damaged morphologies can be explained by the thermodynamic interactions between laser and laser plasmas .The research results show that: the rough surface of thin film is induced by the laser pulses , which will absorb more laser energy than the beginning .The melt will be removed by the stronger ablation and will be accumulated outside of the laser working area .Since the laser energy is Gaussian distributed , the damaged of multiple laser pulses is centralized and the ablation is limited at the center of laser beam only.This result is a preference for study about film ablation under repetitive laser pulses .
出处 《激光技术》 CAS CSCD 北大核心 2014年第2期210-213,共4页 Laser Technology
基金 国家重大专项课题资助项目(GFZX0205010803.220)
关键词 激光技术 重复激光脉冲 薄膜损伤 高斯光束 X射线衍射光谱 laser technique repetitive laser pulse thin film damage Gaussian beam X-ray diffraction spectra
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  • 1刘浩,潘峰,卫耀伟,马平,张哲,张清华,吴倩.缺陷对HfO_2薄膜的激光弱吸收与损伤阈值的影响[J].应用光学,2015,36(2):314-320. 被引量:2
  • 2王涛,赵元安,黄建兵,贺洪波,邵建达,范正修.多脉冲激光作用下光学薄膜损伤的累积效应[J].光子学报,2006,35(6):859-862. 被引量:11
  • 3孙承伟 陆启生 范正修.激光辐照效应[M].北京:国防工业出版社,2002.336-381.
  • 4Fedosejevs R, Kirkwood S E, Holenstein R. Femotosecond In- teraction Processes Near Threshold: Damage and Ablation [J]. SPIE, 2007,6403(2) :1.
  • 5Crawford T H, Yamanaka J, Hsu E M, et al. High - resolution Observations of an Amorphous Layer and Subsurface Damage Formed by Femtosecond Laser Irradiation of Silicon [J]. Applied Physics, 2008,103 (053104) :1.
  • 6Rublack T, Hartnaner S, Mergner M, et al. Mechanism of Selec- tive Removal of Transparent Layers on Semiconductors Using Ultrashort Laser Pulses [J]. SPIE ,2012 ,8247 (2) : 1.
  • 7罗晋生,刘恩科,朱秉生.半导体物理学[M].北京:电子工业出版社,2007.
  • 8Yilbas B S, Kaylon M. Analytical Solution for Pusled Laser Heating Process:Convective Boundary Condition Case [J]. Int J Heat, Mass, Transfer,2002,45(7) : 1571.
  • 9夏志林,赵元安,黄才华,邵建达,薛亦渝,杨芳芳,郭培涛.光学薄膜激光预处理能量密度选取[J].光学学报,2009,29(2):560-565. 被引量:4
  • 10周明,范正修,邵建达,赵元安,李大伟.不同波长激光同时辐照薄膜热效应研究[J].光子学报,2009,38(10):2608-2612. 被引量:5

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