摘要
介绍了化学气相沉积(CVD)中的传质现象研究的最新进展,从传质方程的建立到边界条件确定都进行了详细的介绍,并举例说明了数值分析的结果对反应器设计与工艺参数的优化的指导作用。
Review of study on the transport phenomena in chemical vapour deposition(CVD) is given in the paper,and the numerical simulation models based on fluid dynamics and reaction chemistry and boundary conditions are intrduced. Some examples of CVD models are described,and the CVD models can provide much aid in reactor design and CVD process optimization.
出处
《材料导报》
EI
CAS
CSCD
北大核心
2000年第3期13-15,共3页
Materials Reports
