摘要
本文就溅射靶的分类、选用靶材的原则及常用几种靶的制备等问题进行了探讨。
In this paper, the classification of the sputtering targets the principle of target selection and the preparation of the several common target are discussed.
出处
《真空》
CAS
北大核心
2000年第1期37-39,共3页
Vacuum
关键词
溅射镀膜
制靶技术
靶材
溅射靶
sputtering coating
technique of the target preparation
target
