摘要
阐述对半导体行业等离子化学气相淀积设备干扰的基本发生源头,干扰现象以及设备维修人员在维修过程中抗干扰应采取的措施。
This paper discusses on interference source and Performance about the Anti interference measures of the Plasma Chemical vapor deposition Equipment, and in the process of the equipment repair, the anti interference measures should to be taken.
出处
《中国仪器仪表》
2012年第1期49-51,共3页
China Instrumentation
关键词
气相淀积
半导体
电磁辐射
抗干扰
Vapor deposition SemiconductorElectromagnetic radiationAnti interference
