摘要
文章简述了国内外非晶硅太阳电池的发展及通常用于沉积含氢非晶硅（ａ－Ｓｉ：Ｈ）薄 膜的 ＰＣＶＤ工作原理。详尽叙述了 ＨＬＲＢ－ＴＤ６Ａ非晶硅太阳电池镀膜机的结构和 设计特点。该机设计合理，本底真空度高，电场、气流、温度分布均匀，无各室间不同 反应气体的交叉污染，沉积的Ｐ、Ｉ、Ｎ型ａ－Ｓｉ：Ｈ材料性能极佳，是在聚酯膜、不锈 钢带等柔性衬底上连续沉积ａ－Ｓｉ ：Ｈ太阳电池的理想设备。
The development of solar cell at home and abroad, and the operational principle of PCVD depositing a-Si:H film are presented in this paper. The features of structure and design of a-Si:H solar cell coater HLRB-TD6A are introduced in detail. Reasonable design, high background pressure, uniform distribution of electric field, air flow and temperature, non cross-contamination of different reactive gasses among various chambers, best performance of the a-Si:H material (P. I or N type). The plant is a desirable device of a-Si:H solar cell roll to roll deposited on the soft substrate e. g polyester film, stainless steel band.
出处
《真空》
CAS
北大核心
1990年第5期5-12,共8页
Vacuum
