摘要
采用射频磁控反应溅射法在金刚石自支撑膜衬底上沉积了AlN薄膜,XRD结果表明得到了(002)面择优取向的AlN薄膜;AFM的表面形貌结果显示薄膜表面平整,晶粒均匀,表面粗糙度为2.97 nm。XPS分析结果表明,离子剥蚀2.1 nm后Al/N原子百分比接近于1∶1;结合红外透过曲线和纳米力学探针测试,表明AlN薄膜在1500～800 cm-1波段对金刚石膜有约14%的增透作用,其平均硬度为21.5 GPa,平均弹性模量为233.3 GPa。
AlN film was deposited on diamond film by RF reactive magnetron sputtering.The XRD spectrum shows that AlN is（002） plane preferential orientation.The results of AFM indicate that the surface of the film is smooth,the grain is uniform and the roughness is 2.97 nm.XPS analysis reveals that Al/N atomic ratio is close to 1：1 after etching 2.1 nm.The properties of the film were investigated by FTIR and Nano-Indenter XP,and the results are that the AlN film has antireflective effect on the diamond film,which is about 14% in the wavenumber of 1500-800 cm-1.The average hardness is 21.5 GPa and the average elastic modulus is 233.3 GPa for the film.
出处
《材料热处理学报》
EI
CAS
CSCD
北大核心
2011年第8期1-5,共5页
Transactions of Materials and Heat Treatment
基金
国家"863"计划支持项目(2008AA03Z408)
