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Effect of mechanical anisotropy on material removal rate and surface quality during polishing CdZnTe wafers 被引量:1

Effect of mechanical anisotropy on material removal rate and surface quality during polishing CdZnTe wafers
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摘要 The mechanical characters of CdZnTe crystal were investigated by nanoscratch tests, and the effects of mechanical anisotropy on the material removal rate and surface quality were studied by polishing tests. There is a peak of frictional coefficient at the early stage of scratch, and increasing the vertical force will result in the increase of peak value correspondingly. The fluctuation phenomenon of frictional coefficient is generated at high vertical force. The lateral forces show the apparent twofold and threefold symmetries on (110) and (111) planes, respectively. To obtain high surface quality, low polishing pressure and hard direction (〈 T10 〉 directions on (110) plane and 〈 112 〉 directions on (111) plane) should be selected, and to achieve high material removal rate, high polishing pressure and soft direction (〈001〉 directions on (110) plane and 〈 121 〉 directions on (111) plane) should be selected. The mechanical characters of CdZnTe crystal were investigated by nanoscratch tests, and the effects of mechanical anisotropy on the material removal rate and surface quality were studied by polishing tests. There is a peak of frictional coefficient at the early stage of scratch, and increasing the vertical force will result in the increase of peak value correspondingly. The fluctuation phenomenon of frictional coefficient is generated at high vertical force. The lateral forces show the apparent twofold and threefold symmetries on (110) and (111) planes, respectively. To obtain high surface quality, low polishing pressure and hard direction (〈 T10 〉 directions on (110) plane and 〈 112 〉 directions on (111) plane) should be selected, and to achieve high material removal rate, high polishing pressure and soft direction (〈001〉 directions on (110) plane and 〈 121 〉 directions on (111) plane) should be selected.
出处 《Rare Metals》 SCIE EI CAS CSCD 2011年第4期381-386,共6页 稀有金属(英文版)
基金 supported by the Key Project of the National Natural Science Foundation of China (No. 50535020) the Fund of the State Key Laboratory of Solidification Processing in Northwestern Polytechnical University (No. SKLSP200902)
关键词 cadmium compounds single crystals nanoscratch tests frictional coefficient material removal rate surface quality ANISOTROPY cadmium compounds single crystals nanoscratch tests frictional coefficient material removal rate surface quality anisotropy
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