摘要
回顾了集成电路技术的发展历史,展望了集成电路未来的发展趋势。在微电子技术诞生和发展过程中具有一些里程碑式的发明,如:晶体管、集成电路、集成电路平面工艺、MOS器件、微处理器、光刻技术、铜互连工艺的发明等。集成电路技术一直并将继续以特征尺寸缩小、集成度提高的模式,按摩尔定律预测的指数增长率发展。随着器件特征尺寸逐渐缩小并逼近其物理极限,集成电路技术的发展将受到来自于材料、工艺和物理基础等方面的挑战,呈现出多维发展的趋势,这些挑战涉及了微电子学的理论基础。
We review the birth and development of integrated circuits.There are many historical milestone inventions such as transistors,integratedcircuits,theplanarprocess,metal—oxide—semiconductor transistors,microprocessors,lithography and copper interconnect technology.technology integrated circuits has been and will continue developing according to Moore＇s Law with shrinking size but increasing integration.As device feature size approaches its physical limit,ntegrated circuits will face new challenges involving material,technology and basic physics,and will develop in amulti—dimensional fashion.As these challenges involve the theoretical basis of microelectronics.
出处
《微处理机》
2011年第3期1-5,9,共6页
Microprocessors
关键词
微电子学
集成电路
摩尔定律
Microelectronics
Integrated circuits
Moore＇s Law
