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Effects of the sputtering power on the crystalline structure and optical properties of the silver oxide films deposited using direct-current reactive magnetron sputtering

Effects of the sputtering power on the crystalline structure and optical properties of the silver oxide films deposited using direct-current reactive magnetron sputtering
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摘要 This paper reports that a series of silver oxide (AgzO) films are deposited on glass substrates by direct-current reactive magnetron sputtering at a substrate temperature of 250 ℃ and an oxygen flux ratio of 15:18 by modifying the sputtering power (SP). The AgxO films deposited apparently show a structural evolution from cubic biphased (AgO + Ag20) to cubic single-phased (Ag20), and to biphased (Ag20 + AgO) structure. Notably, the cubic single-phased Ag20 fihn is deposited at the SP = 105 W and an AgO phase with (220) orientation discerned in the Ag^O films deposited using the SP 〉 105 W. The transmissivity and refiectivity of the AgxO films in transparent region decrease with the increase the SP, whereas the absorptivity inversely increases with the increase of the SP. These results may be due to the structural evolution and the increasing film thickness. A redshift of the films' absorption edges determined in terms of Tauc formula clearly occurs from 3.1 eV to 2.73 eV with the increase of the SP. This paper reports that a series of silver oxide (AgzO) films are deposited on glass substrates by direct-current reactive magnetron sputtering at a substrate temperature of 250 ℃ and an oxygen flux ratio of 15:18 by modifying the sputtering power (SP). The AgxO films deposited apparently show a structural evolution from cubic biphased (AgO + Ag20) to cubic single-phased (Ag20), and to biphased (Ag20 + AgO) structure. Notably, the cubic single-phased Ag20 fihn is deposited at the SP = 105 W and an AgO phase with (220) orientation discerned in the Ag^O films deposited using the SP 〉 105 W. The transmissivity and refiectivity of the AgxO films in transparent region decrease with the increase the SP, whereas the absorptivity inversely increases with the increase of the SP. These results may be due to the structural evolution and the increasing film thickness. A redshift of the films' absorption edges determined in terms of Tauc formula clearly occurs from 3.1 eV to 2.73 eV with the increase of the SP.
出处 《Chinese Physics B》 SCIE EI CAS CSCD 2011年第2期370-375,共6页 中国物理B(英文版)
基金 supported by the National Natural Science Foundation of China (Grant No. 60807001) the National Basic Research Program of China (Grant No. 2011CB201605) the Foundation of Henan Educational Committee (Grant No. 2010A140017)
关键词 Ag2O film direct-current reactive magnetron sputtering x-ray diffraction optical prop-erties Ag2O film, direct-current reactive magnetron sputtering, x-ray diffraction, optical prop-erties
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