摘要
为进一步探求磁控溅射的机理，本文通过用直流和射频两种磁控溅射沉积ＩＴＯ（ＩｎｄｉｕｍＴｉｎＯｘｉｄｅ）膜的方法，由沉积后的ＩＴＯ膜的特性来揭示不同溅射方法的机制。
Abstract In order to further pursue the innate characters of magnetron sputtering, the effects of different deposition methods were revealed by the properties of ITO films deposited by DC and RF magnetron sputtering. The essential differences between the DC and RF magnetron sputtering were concluded in this article.
出处
《真空》
CAS
北大核心
1999年第2期15-17,共3页
Vacuum
