期刊文献+

Optimum Indium Concentration for Growth of 1.3 μm InAs/InxGa1-xAs Quantum Dots in a Well 被引量:1

Optimum Indium Concentration for Growth of 1.3 μm InAs/InxGa1-xAs Quantum Dots in a Well
原文传递
导出
摘要 Five InAs/InxGa1-xAs quantum dots in a well (DWELL) with different indium concentration x are grown by solid source molecular beam epitaxy. The high quantum dot density is observed in the InAs/In0.3Ga0.7As DWELL. The photoluminescence (PL) experiments indicate that the ground state peaks of InAs/In0.15 Ga0.85As and InAs/In0.22 Ga0.78As DWELLs shift to 1.31 and 1.33μm, respectively. The optical properties are investigated by using the PL and piezoreflectance spectroscope methods. An abnormal blue shift has been observed with the further increase of x from 0.22 to 0.30. Five InAs/InxGa1-xAs quantum dots in a well (DWELL) with different indium concentration x are grown by solid source molecular beam epitaxy. The high quantum dot density is observed in the InAs/In0.3Ga0.7As DWELL. The photoluminescence (PL) experiments indicate that the ground state peaks of InAs/In0.15 Ga0.85As and InAs/In0.22 Ga0.78As DWELLs shift to 1.31 and 1.33μm, respectively. The optical properties are investigated by using the PL and piezoreflectance spectroscope methods. An abnormal blue shift has been observed with the further increase of x from 0.22 to 0.30.
出处 《Chinese Physics Letters》 SCIE CAS CSCD 2007年第11期3260-3263,共4页 中国物理快报(英文版)
基金 Supported by the National Natural Science Foundation of China under Grant No 60567001, and the Cultivated Foundation for the 'Academic Cadreman of Yunnan University'
关键词 coated conductor buffer layer self-epitaxy CeO2 coated conductor, buffer layer, self-epitaxy, CeO2
  • 相关文献

参考文献15

  • 1Krishna S 2005 Infrared Phys. Technol. 47 153
  • 2Eliseev P G, Li H, Liu G T, Stintz A, Lester L F and Malloy K J 2001 IEEE J. Quantum Electron. 7 135
  • 3Stintz A, Liu G T, Gray A L, Spillers R, Delgado S M and Malloy K J 2000 J. Vac. Sci. Technol. B 18 1496
  • 4Ustinov V M, Maleev N A, A. Zhukov E, Kovsh A R, Egorov A Y, Lunev A V and Bimberg D 1999 Appl. Phys. Lett. 74 2815
  • 5Liu H Y, Hopkinson M, Harrison C N, Frith R, Mowbray D J and Skolnick M S 2003 J. Appl. Phys. 93 2931
  • 6Chen J X, Oesterle U, Ffiore A, Stanley R P, Delgado S M and Molloy K J 2001 Appl. Phys. Lett. 79 3681
  • 7Park Y M, Park Y J, Kim K M, Shin J C, Song J D, Lee J Land Yoo K H 2004 J. Appl. Phys. 95 123
  • 8Krishna S, Forman D, Annamalai S, Dowd P and Carothers D 2005 Appl. Phys, Lett. 86 193501
  • 9Wang C, Chen P P, Tang N Y, Xia C S, Lu W and Chen Z H 2006 J. Crystal. Growth 289 547
  • 10Wang C, Chen P P, Zhou X C, Wang S W, Chen X S and Lu W 2005 Acta Phys. Sin. 54 3337 (in Chinese)

同被引文献1

引证文献1

二级引证文献1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部