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分子束外延高Mg掺杂GaN的发光特性 被引量:3

OPTICAL PROPERTY OF HEAVILY Mg DOPED GaN GROWN BY MBE
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摘要 采用分子束外延技术在蓝宝石衬底上制备Mg掺杂的立方相p-GaN,并对其不同温度下的光致发光光谱进行了研究.实验观察到高Mg掺杂GaN中施主受主对发光的反常温度行为.理论分析表明,高Mg掺杂GaN中施主受主对的发光受到陷阱与受主间竞争俘获非平衡空穴过程和空穴隧穿输运过程的影响. Mg doped GaN with cubic structure have been grown by molecular beam epitaxy on sapphire substrate. Temperature dependent photoluminescence of heavily Mg doped GaN have been investigated in order to study the properities of donor acceptor pair recombination. We have found unusual temperature dependent behaviors of donor acceptor pair recombination in heavily Mg doped GaN. The photoluminescence intensity of donor acceptor pair recombination decreases below 35K and then increases as the temperature increases up to 100K. This behavior may be explained by employing three energy level system, e.g. shallow donor level, shallow acceptor level and hole trap level. The main transition processes and their dynamic processes of non equilibrum holes, which bumped by excited laser, have been studied. The holes are caught in the hole traps and they subsequently transfer from the traps to shallow acceptors by tunneling, where recombination with electrons takes place. The theoretical calculations are in accordance with the experiment results. The PL intensity of donor acceptor recombination in heavily Mg doped GaN is determined by the effects of hole trap and tunneling.
出处 《发光学报》 EI CAS CSCD 北大核心 1999年第2期148-151,共4页 Chinese Journal of Luminescence
基金 中国科学院出国人员回国择优支持基金
关键词 光致发光 隧穿效应 分子束外延 氮化镓 掺镁 GaN, photoluminescence, tunneling effect
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参考文献3

  • 1Huang J W,Appl Phys Lett,1996年,68卷,2392页
  • 2Smith M,Appl Phys Lett,1996年,68卷,1883页
  • 3Yang Z,Appl Phys Lett,1995年,67卷,1686页

同被引文献29

  • 1李晓兰,郑赛珠,叶志清,邓海东,饶丰,熊志华.脉冲激光沉积系统(PLD)的应用[J].江西师范大学学报(自然科学版),2004,28(6):515-517. 被引量:4
  • 2吕珂,叶志清,薛琴,柯强,闵秋应.脉冲激光沉积GaN薄膜[J].江西师范大学学报(自然科学版),2005,29(5):453-456. 被引量:1
  • 3Friichtenicht J F. Laser - generated Pulsed Atomic Beams [J]. Rev. Sci. Instrum. , 1973,45.
  • 4Gupta A, B Hussey W. Laser Deposition of Yba2Cu3O7 Films Using a Pulsed Oxygen Source[J]. Appl. Phys. Lett. ,1991,58.
  • 5Mah K W, Mosnier J P, McOlynn E,et al. Study of Photoluminescence at 3. 310 and 3. 368 eV in GaN/sapphire (0001) and GaN/GaAs (001) Grown by Liquid - target Pulsed - laser Deposition []]. Appl. Phys.Lett. , 2002,80 (18) :3 301-3 303.
  • 6Gon NamKoong,Doolittle W Alan, April S Brown,et al. Role of Sapphire Nitridation Temperature on GaN Growth by Plasma Assisted Molecular Beam Epitaxy: Part Ⅰ. Impact of the Nitridation Chemistry on Material Characteristics [J]. Appl. Phys. ,2002,91(4) :2 499 - 2 507.
  • 7Gon NamKoong, W. Alan Doolittle. April S. Brown et al..Role of sapphire nitridation temperature on GaN growth by plasma assisted molecular beam epitaxy: part I. Impact of the nitridation chemistry on material characteristics[J]. J. Appl.Phys. , 2002. 91(4):2499-2507.
  • 8K. W. Mah. J.-P. Mosnier, E. McGlynn et al.. Study of photolumineseence at 3. 310 and 3. 368 eV in GaN/sapphire(0001) and GaN/GaAs (00l) grown by liquid target pulsed-laser deposition [J]. Appl. Phys. Lett. , 2002, 80(18) :3301-3303.
  • 9Mitsuo Okamoto, Yoke Khin Yap, Masashi Yoshimura et al..The ohmic character of doped AIN films[J]. Diamond and Related Materials, 2001, 10:1322-1325.
  • 10G. Y. Zhang. Y. Z. Tong, Z. J. Yang et al.. Relationship of background carrier concontrtation and defecty in GaN grown by metalorganic vapor phase epitaxy [J]. Appl. Phys. Lett.,1997, 71(23):3376-3378.

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