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热退火对氮化镓金属-半导体-金属结构紫外光电探测器性能的影响 被引量:4

Effects of Thermal Annealing on the Properties of GaN Metal-Semiconductor-Metal UV Photodetectors
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摘要 采用金属有机气相外延的方法制备高质量氮化镓薄膜。采用真空热蒸发的方法蒸镀一层金膜,通过传统紫外曝光及湿法腐蚀的方法,制备得到具有金属-半导体-金属(MSM)结构的紫外光电探测器。通过对器件进行不同温度不同时间的热退火处理,使器件的性能得到了改善。在3 V偏压下,器件的暗电流仅为200 pA,响应度的峰值出现在362 nm处,其对应的探测率为1.2×1011cm.Hz1/2/W。对器件性能影响的形成机理进行了深入分析,主要归因于热处理将Au原子引入到薄膜中。 Metal-semiconductor-metal structured GaN ultraviolet photodetectors are fabricated on sapphire substrates by metalorganic chemical vapor deposition.The properties of GaN photodetectors are improved through thermal annealing.With a 3 V bias,the very low dark current is about 200 pA,the maximum responsivity of 0.19 A/W is achieved at 362 nm,and the corresponding detectivity is 1.2×1011cm·Hz1/2/W.The physical mechanism about the effects of thermal annealing is studied,which is attributed to the introducing Au by the thermal annealing.
出处 《中国激光》 EI CAS CSCD 北大核心 2010年第3期822-825,共4页 Chinese Journal of Lasers
关键词 光电子学 光电探测器 氮化镓 退火 肖特基 暗电流 optoelectronics photodetector GaN annealing Schottky dark current
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