摘要
氧化锌薄膜的透明导电特性与化学计量偏离和溅射条件有关．以2％（质量分数）氧化铝掺杂的氧化锌陶瓷作靶，采用RF磁控溅射技术制备的透明导电薄膜，其电阻率4．5×10－3Ωcm，载流子浓度2．8×1020cm－3，霍尔迁移率15．8cm2／V·s，平均透射率（400～800nm）大于80％．
The dependence of electrical and optical properties on target material and sputtering conditions have been investigated. Al2O3 were doped with 2% (mass fraction) in the target of ZnO.The film were produced by RF planar magnetron sputtering. The resistivity of the film is 4.5 × 10-3Ωcm,carrier concentration and Hall mobility are 2.8x 1020cm-3 and 15.8cm2/V.s respectively. The optical transmittance is about 80%.
出处
《材料研究学报》
EI
CAS
CSCD
北大核心
1999年第3期331-333,共3页
Chinese Journal of Materials Research
