摘要
利用反应性射频磁控溅射在Ｓｔ（１００）单晶衬底上沉积氯化碳薄膜，并系统地研究了薄膜的结构、成分及化学健等信息．Ｘ射线衍射分析表明，制备的氯化碳薄膜具有非晶结构红外吸收话说明薄膜中碳、及原子结合成化学键，其中包括碳、氮单键在红外谱中还发现了多光束干涉现象，计算的结果与扫描电子显微镜对薄膜表面和截面形貌的分析结果相符，并由此推算出薄膜的折射率ｎｒｅｌ．９．Ｘ射线光电子能谱分析证实了碳原子与氮原子间存在单键，并得出薄膜中Ｘ。
Carbon nitride films were deposited on Si(100) single-crystalline wafers by reactive radiofrequency magnetron sputtering. The structures, compositions, and chemical bonding states of the obtainedfilms were investigated systematically. X-ray diffraction suggested the prepared films had amorphousstructures. Infrared transmittance spectra indicated the carbon and nitrogen atoms incorporated withchemical bonds, including CN single bonds. Multiple beam interference (MBI) was observed in the infraredspectra, which was proved by scanning electron microscope analyses. The refraction indices of the filmswere about 1.9 based on the calculation of MBI. X--ray photoelectron spectra reioforced the suggestionthat there existed single bonds between carbon and nitrogen atoms, and also showed the atomic ratio of N to C was approximately 0.45.
出处
《金属学报》
SCIE
EI
CAS
CSCD
北大核心
1999年第4期439-442,共4页
Acta Metallurgica Sinica
基金
国家自然科学基金
中国科学院"九五"重大项目
关键词
氮化碳薄膜
射频磁控溅射
沉积
结构
成键性质
carbon nitride film, multiple beam interference, radio frequency magnetron sputtering
