摘要
用ArF脉冲激光在Pt／Ti／SiO2／Si衬底上合成了非晶态SrBi2Ta2O9铁电薄膜，研究了铁电相转变采用常规热退火。
SrBi2Ta2O9 amorphous ferroelectric thin films were synthesised on Pt/Ti/SiO2/Sisubstrate by ArF pulsed laser deposition. The recrystallization for amorphous ferroelectric thin films werestudied. The SBT thin films were crystallized using usual annealing, laser induced and low temperature,high pressure hydrothermal.
出处
《材料研究学报》
EI
CAS
CSCD
北大核心
1999年第2期221-224,共4页
Chinese Journal of Materials Research
