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氮流量对采用独立钛靶制备的(Ti,Al)N薄膜结构与性能的影响 被引量:2

Nitrogen Flow Rate and Mechanical Properties of (Ti,Al)N Coatings Deposited by Magnetron Sputtering of Ti Target
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摘要 采用直流反应磁控溅射系统,选择独立Ti靶在3003AlMn合金表面在不同氮流量下制备(Ti,Al)N薄膜,采用扫描电镜、能谱分析、X射线衍射、极化曲线试验、磨损试验、薄膜厚度和显微硬度试验等手段表征了薄膜的沉积速率、化学成分、微结构和力学性能。结果表明,以独立Ti靶在铝衬底表面可以直接生成晶粒尺寸细小与基底结合良好的(Ti,Al)N薄膜,同时可以增加铝合金的表面硬度,提高表面耐蚀性能及表面光泽度。氮流量对(Ti,Al)N薄膜影响显著,氮流量为7cm3/min时制备的(Ti,Al)N薄膜晶粒最细小、致密,小尺寸纳米化的晶粒对提高3003AlMn合金耐磨损性和耐蚀性最佳,但沉积速率低,硬度增幅小。 The (Ti,Al)N coatings were deposited by DC magnetron sputtering of Ti target on substrates of 3003 Al-Mn alloy.The impacts of the coating conditions,such as the nitrogen flow rate,pressure,deposition rates and substrate temperature,on mechanical properties of the coating were evaluated.The microstructures were characterized with X-ray diffraction,scanning electron microscopy and conventional mechanical probes.The results show that the (Ti,Al) N coatings significantly improve its surface hardness,corrosion resistance,compactness and interfacial adhesion.Among other factors,nitrogen flow rate affects most strongly the microstructures of the coating.At a flow rate of 7 cm3/min,the best coating was obtained with finest grains,most compact surfaces and highest wear and corrosion resistances,however,the flow rate resulted a low deposition rate and a less increment of surface hardness.
出处 《真空科学与技术学报》 EI CAS CSCD 北大核心 2010年第4期395-400,共6页 Chinese Journal of Vacuum Science and Technology
基金 河南省科技攻关项目(0624250012) 河南省教育厅自然科学研究项目(2007450001)
关键词 直流反应磁控溅射 3003AlMn合金 Ti靶 氮流量 Reactive DC magnetron sputtering 3003AlMn alloy Ti target Nitrogen flow
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