摘要
用ＥＣＲＣＶＤ（电子回旋共振化学气相沉积）方法沉积出了多晶金刚石薄膜，测量了薄膜的Ｒａｍａｎ散射谱、Ｘ射线衍射谱和ＳＥＭ。生长条件是：Ｖ（ＣＨ４）／Ｖ（Ｈ２）＝４％，气体总流量是１５０ｓｃｍ，反应压力是０．１Ｐａ，微波功率是７００Ｗ，衬底偏压是－１５０Ｖ。发现了在金刚石薄膜沉积初期阶段的分形生长现象，用ＤＬＡ模型解释了其分形生长机制，用ＭｏｎｔｅＣａｒｌｏ方法对其生长过程进行了计算机模拟，理论与实验结果相符。
Polycrystalline diamond films is deposited by means of the ECR CVD method.Characterization and structure of the films are investigated by X ray diffraction,Raman spectroscopy,and SEM(scanning electron microscopy),respectively.Process conditions are: V (CH 4)/ V (H 2)=4%,total flow is 150 sccm,reaction pressure is 0.1Pa,microwave power is 700W.and bias of substrate is-150V.A film with fractal characteristic is for the first time found during initial stage of diamond film deposited.Growth mechanism of the film is explained using DLA model.And growth process of the film is simulated by means of the Monte Carlo method.Experiment results are in very good agreement with theoretical model.
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
1999年第1期69-73,共5页
Journal of Synthetic Crystals
基金
国家自然科学基金
北京市自然科学基金
