摘要
采用阴极恒电位法在氧化锡铟导电玻璃(ITO)基板上电沉积了ZnS薄膜,用X射线衍射仪(XRD)、原子力显微镜(AFM)和紫外/可见/近红外吸收光谱仪(UV-VIS-NIR)对薄膜的物相结构,微观形貌和光学性能进行了表征,研究了沉积时间对薄膜的结构以及光学性能的影响。研究结果表明:当沉积时间为6min时,可以得到表面均匀而致密的ZnS薄膜,在500～1000nm波长范围内的薄膜透过率约为40%～60%。随着沉积时间的增加,ZnS薄膜的结晶程度、微观形貌均有所改善,但当沉积时间达到或超过8min时,薄膜的结构和性能又有所下降。
Zinc sulfide （ZnS） thin films were deposited on indium tin oxide （ITO） glass by the cathodic electrodeposition method. The phase compositions, morphologies and optical properties of the asdeposited thin films were characterized by X-ray diffraction （ XRD）, atomic force microscope （AFM） and uhraviolet-visible-infrared spectrophotometer （UV-VIS-NIR）. The effect of deposition time on the structure and optical properties of ZnS thin films was investigated. The results show that when the deposition time is 6 min, a dense and homogenous surface morphology ZnS thin films can be obtained and the transmittance of the thin films is about 50%-60% in the range of 500-1000 nm. As the deposition time increasing, the crystallinity and morphologies of the ZnS thin films are improved, but when the deposition time is up to 8 min or above, it will give disadvantages to the thin films.
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
2010年第B06期69-72,共4页
Journal of Synthetic Crystals
基金
陕西科技大学研究生创新基金资助项目
关键词
ZNS薄膜
电沉积
X射线衍射
沉积时间
ZnS thin films
electrodeposition
X-ray diffraction
deposition time
