摘要
采用射频磁控溅射法,在石英衬底上制备了Zn1-xMgxO(x=0.00～0.16)薄膜。利用X射线衍射(XRD)、扫描电子显微镜(SEM)、紫外-可见分光光度计和光致发光(PL)光谱等分析了薄膜的结构、形貌和光学特性。结果表明:当x≤0.10时薄膜保持六角纤锌矿结构,而x=0.16时已出现MgO立方相;所有薄膜晶粒大小均匀,在100～150 nm之间;透光率在80%以上;薄膜带隙Eg与Mg含量呈线性关系;薄膜PL谱由较弱的紫外发光峰和较强的可见发光带组成,随Mg含量的增加紫外发光峰蓝移。
A series of Zn1-xMgxO（x=0.00-0.16） films have been prepared on quartz substrates by RF magnetron sputtering.Several characterization techniques,including X-ray diffraction（XRD）,scanning electron microscope（SEM）,UV-Vis spectrophotometer,and photoluminescence measurement,have been used to investigate the crystal structure,surface morphology,and optical properties of the films,respectively.The results reveal that the obtained films with Mg content x up to about 0.1 are without phase separation;the films are uniform with grain size in the range of 100-150 nm;the optical transmittance is over 80%,and the band gap（Eg） has linear relationship with Mg content：Eg=2.03x＋3.26（eV）;the PL spectra of the films are composed of the weaker UV emission band and stronger visible band,and UV emission peak has a blue shift with the increase of Mg content.
出处
《光电子．激光》
EI
CAS
CSCD
北大核心
2010年第7期1021-1025,共5页
Journal of Optoelectronics·Laser
基金
国家自然科学基金资助项目(50975301)
重庆大学研究生创新基金资助项目(200801A1B0060265)
重庆大学"211工程"三期创新人才培养计划建设资助项目(S-09109)
重庆大学大型仪器设备开放基金资助
