摘要
用氦热解吸谱(THDS)研究了10keV,4.0×1017cm-2剂量He+辐照(200)择优取向Al的氦热解吸行为及其与升温速率的关系。结果显示,He解吸开始于270℃附近,THDS中无干扰峰存在。He解吸行为与升温速率密切相关,其解吸峰个数及峰位随升温速率的变化而改变,且不遵循通常的一级化学反应模型,而可能是多级或一级与多级化学反应的混合模型。
Helium was implanted into the high purity aluminum samples with preferred orientation of （200）, under the conditions of beam energy of 10keV and a helium dosage of 4.0 × 10^17 ions cm^-2. The helium thermal desorption behavior of the He-implanted A1 samples and its dependence on the heating rate were evaluated with thermal desorption spectroscopy （THDS）. The results show that the on-set of He desorption is about 270℃, and no spurious peak can be observed in its THDS spectra. The heating rate significantly affects the number of THDS peaks, and the peak temperature positions, deviating from the widely accepted first-order chemical reaction model. Possible mechanisms were tentatively explained.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2010年第2期185-188,共4页
Chinese Journal of Vacuum Science and Technology
基金
国家自然科学基金资助项目(50671017)
