摘要
针对干涉图解析法的面形测量，提出了用最小二乘法做二次曲线拟合对干涉条纹进行细化的方法，提高了CCD测试精度，给出了实测结果。
The analytical method for interferogram is usuaully used in measurement on thesurface shape of objects. In this paper a method used in thinning the interference fringes is proposed. By using least Square methed to fit quadric curve, the measurement precision of CCD isincreased. Finally the observed results are given.
出处
《电子测量与仪器学报》
CSCD
1998年第3期13-17,共5页
Journal of Electronic Measurement and Instrumentation
基金
黑龙江省自然科学基金
哈尔滨师范大学科研基金
