摘要
首先采用固相反应法制备NixZn1-xFe2O4铁氧体靶材（x=0．2~0．8），研究了Ni取代量对靶材性能的影响；并选用Ni0.5Zn0.5Fe2O4靶材，采用射频磁控溅射法在Si（100）基片上制备了NiZn铁氧体薄膜。靶材样品的分析结果表明，随Ni含量增加，样品的X射线衍射峰向高角方向移动，晶格常数和平均晶粒尺寸都单调减小；当x=0．5～0．6时，NixZn1—xFe2O4铁氧体饱和磁感应强度Ba较高，矫顽力凰较小。薄膜样品的分析结果表明，制备的薄膜经800℃退火后，呈尖晶石结构，并沿（400）方向择尤取向；薄膜的饱和磁化强度憾和面内矫顽力限分烈为310kA／m和8.833kA／m.
The NixZn1-xFe2O4 （x=0.2-0.8） ferrite targets were prepared by solid state reaction method, then the effects of Ni content on the properties of NiZn targets were investigated. And based on study on targets, Ni0.5Zn0.5Fe2O4 ferrite thin films were prepared on single-crystal Si（100） substrate by radio frequency （RF） magnetron sputtering technique. The XRD pattern of target materials showed that, with the increase of Ni content, diffraction peaks of target samples shift to higher angle, which indicates lattice constant and average grain size decrease monotonously. At the optimal condition of x=0.5~0.6, NixZn1-xFe2O4 ferrite target has a larger Bs and lower He. The results of films annealed at 800℃ indicated that the film exhibits spinel structure, preferential （400） orientation, saturation magnetization （Ms） of 310kA/m and in-plane coercivity （He） of 8.833kA/m, respectively.
出处
《磁性材料及器件》
CSCD
北大核心
2009年第3期20-23,共4页
Journal of Magnetic Materials and Devices
关键词
NIZN铁氧体
靶材
薄膜
磁性能
微观结构
NiZn ferrite
targets
thin films
magnetic properties
microstructure
