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添加剂对钯电沉积层氢含量和内应力的影响 被引量:3

Effect of Additives on Hydrogen Content & Internal Stress of Palladium Electrodeposits
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摘要 采用电化学方法研究了添加剂对把电沉积层氢含量和内应力的影响。结果表明,含有光亮剂的镀液中所获得的钯电沉积层氢含量较无添加剂的显著提高,表面活性剂可极大降低镀层氢含量。添加剂的协同作用使镀层应力状态发生变化;在电沉积初期,沉积层内应力变化较大,随后逐渐趋于稳定。 The effect of additives on hydrogen content and internal stress of palladiumelectrodeposits was studied by electrochemical method. The results show that hydrogen contentof the obtained palladium electrodeposits from the bath with brighteners is obviously higherthan that without additives, and will be remarkably decreased in the bath with surfactant.Thesynergistic action of the additives may cause the electrodeposits to show in tensile orcompression stress. The internal stress of the deposits was quite changable at the beginningof the electrodeposition and gradually turned to be stable later on.
机构地区 厦门大学化学系
出处 《电镀与涂饰》 CAS CSCD 1998年第1期6-10,共5页 Electroplating & Finishing
关键词 电沉积层 氢含量 内应力 助剂 镀层 电镀 palladium, electrodeposition, hydrogen content, stress, additive
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  • 1Lai C K,J Electroanal Chem,1992年,322卷,267页
  • 2周绍民,金属电沉积.原理与研究方法,1987年,284页

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