摘要
以四异丙醇钛（简称ＴＰＴ）为钛源物质，采用常压化学气相沉积（ＣＶＤ）法制备了ＴｉＯ２膜，并对其光学性质进行了研究。实验结果表明：沉积条件是影响ＴｉＯ２膜的沉积率和光学性质的重要因素。在可见光和近红外区，ＴｉＯ２薄膜的透射率在６８％～８５％之间，折光率ｎ＝１．７５～２．２，消光系数ｋ＝２×１０－３～９×１０－３，带隙能Ｅｇ＝０．５～１．８７ｅＶ，制得的ＴｉＯ２膜均匀细密，膜厚为２００ｎｍ～４５０ｎｍ。用ｘ－ｒａｙ扫描仪测得４００℃～７００℃时，ＴｉＯ２膜为锐钛矿结构，４００℃以下为无定形结构。
TiO 2 thin films were prepared by chemical vapour deposition(CVD) with the source of tetra iso propyl titanate (Tiliso OC 3H 7) 4,TPT) and its optical properties are studied.The experimental results show that the deposition rate and optical properties of TiO 2 films depend on deposition conditions.In the visible and near infrayed regions(300 nm～900 nm),TiO 2 films deposited at different deposition conditions had a transmittance T varying in 68%～85%,a refractive index n in 1.75～2.2,an extinction coefficient k in 2×10 -3 ～9×10 -3 ,an optical band gap in 0.5 eV～1.7 deV, and the thickness of TiO 2 film is 200 nm～450 nm.TiO 2 films are polycrystalline structure of anatase at 400℃～700℃ ,and amorphous structure at lower than 400℃.
出处
《太原理工大学学报》
CAS
1998年第3期240-243,共4页
Journal of Taiyuan University of Technology
基金
山西省留学归国人员基金
关键词
化学气相沉积
二氧化钛薄膜
光学性质
chemical vapour deposition
TiO 2 thin film
deposition rate,refractive index,extinction coefficient
