摘要
研究了制备工艺与热处理对TiO2薄膜光响应的影响。用直流反应磁控溅射法在玻璃基片上制备TiO2薄膜,并分别在400℃与600℃下进行热处理,应用XRD、SEM、UV-Vis等分析方法对其进行表征。实验结果表明较高的温度与适当的氧分压可以提高薄膜的结晶度,随着温度的升高,薄膜晶粒粒径增大,其可见光透过率有所降低,而使薄膜的吸收阈值向长波方向移动。
The preparation conditions and the heat treatment influence on the photoresponse of TiO2 thin films were investigated in this study. TiO2 thin films were prepared by DC magnetron sputtering on the glass substrates and were annealed at 400℃ and 600℃ respectively. Properties of the films were characterized by XRD, XPS, SEM and UV-Vis. The results show that appropriate temperature and oxygen partial pressure can improve the crystallinity of the film. With the temperature increasing, the average crystalline size of TiO2 films increases, the visible light transmittance of TiO2 films decreases, and the absorption edge wavelengths of TiO2 films become larger.
出处
《北京石油化工学院学报》
2008年第3期60-63,共4页
Journal of Beijing Institute of Petrochemical Technology
基金
北京市教育委员会科技发展计划面上项目
项目号:KM200710017009
关键词
TIO2薄膜
直流磁控溅射
光响应
TiO2 thin films
DC magnetron sputtering
photoresponse
