摘要
本文对全息曝光技术进行了分析，给出了二次曝光的典型再现光路，并且对制造微电子集成电路上的应用作了展望。
The exposure technique of holography is analyzed. The typical reappearingoptical path of two-exposure is given and it's applications to microclectronic integrated circuits are reviewed.
出处
《微细加工技术》
EI
1997年第3期27-31,共5页
Microfabrication Technology
关键词
激光全息术
二次曝光
微电子集成电路
光刻
laser holography
two exposure
reappearing light path microelectronic circuit
